Nonthermal tetravinylsilane plasma used for thin‐film deposition: Plasma chemistry controls thin‐film chemistry

Corresponding Author

Vladimir Cech

Institute of Materials Chemistry, Faculty of Chemistry, Brno University of Technology, Brno, Czech Republic

Correspondence Vladimir Cech, Institute of Materials Chemistry, Faculty of Chemistry, Brno University of Technology, Purkynova 118, CZ-612 00 Brno, Czech Republic.

Email: cech@fch.vut.cz

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