A stack of indium phosphide (InP) and lattice-matched indium gallium arsenide (InGaAs) layers are grown on a 2′′ InP non-intentionally doped wafer using metal-oxide vapor phase epitaxy (MOVPE). To form a p-i-n-diode, the contact layers are doped with Zn on the p-side (1 × 1018 cm3 in InP, 1 × 1019 cm3 in InGaAs) and with Si on the n-side (5 × 1018 cm3 in InP, 1 × 1019 cm3 in InGaAs), while the absorber layer is non-intentionally doped. On top of the diode layer stack, a layer of silica (SiO2) is deposited. The surface is cleaned with oxygen plasma before depositing the bottom silver mirror by evaporation with a 2 nm germanium layer on both sides for improved adhesion. A layer of silica is deposited on the bottom mirror as well as on a 3′′ silicon wafer, onto which the InP wafer with the diode layer stack will be bonded. For the wafer bonding process, benzocyclobutene (BCB) is spin-coated on the silicon wafer, onto which the InP wafer is bonded under vacuum conditions. Afterward, the InP substrate and the sacrificial layers are removed by wet-chemical etching, exposing the stack of grown diode layers.
In order to create separate photodiodes with a common p-contact, a layer of patterned optical photoresist serves as an etching mask while the top four diode layers (n-InGaAs contact, n-InP layer, InGaAs absorber, and p-InP layer) are partially removed in a series of wet-chemical etching steps, leaving arrays of rectangular mesas, each with a size of 130 × 605 μm2. The next two optical lithography steps are used to create the contact pads on the p-side (Ti/Pt/Au 25 nm/75 nm/200 nm) and n-side (Ni/Ge/Au 30 nm/50 nm/250 nm) by evaporation and lift-off, which create ohmic contacts on the doped InGaAs surfaces. The p-contact around and in between the pixels is shared by all the pixels, while the n-contact on top of each mesa allows individually measuring the current of each pixel [see Fig. 2(a)]. The n-contact has a ring-shape to ensure efficient carrier collection while the blocking of incoming light from the top is minimized.For obtaining an individual wavelength response from each pixel, the optical path length is varied by depositing tuning layers of silicon nitride with different thicknesses. As determined from profilometer measurements on the fabricated arrays, this provides surfaces with significantly reduced roughness (standard deviation of ∼5 nm) compared to the ∼25 nm roughness observed in the grey-scale EBL process.88. K. D. Hakkel, M. Petruzzella, F. Ou, A. van Klinken, F. Pagliano, T. Liu, R. P. J. van Veldhoven, and A. Fiore, Nat. Commun. 13, 103 (2022). https://doi.org/10.1038/s41467-021-27662-1 The roughness obtained previously using a grey-scale EBL process is mainly caused by the three-dimensional proximity-effect correction, which is required to prevent thickness deviations toward the edges, and the re-exposure with high-energy electrons during the lithographic definition of the top mirror on top of the tuning layers. The transition to optical lithography eliminates both of these sources of roughness.In order to reduce the number of lithography/deposition steps, we use a combinatorial deposition technique1717. S.-W. Wang, M. Li, C.-S. Xia, H.-Q. Wang, X.-S. Chen, and W. Lu, Appl. Phys. B 88, 281 (2007). https://doi.org/10.1007/s00340-007-2726-3 of dielectric material in n steps to obtain 2n different layer thicknesses. In the first lithography step, the optically active area of all pixels is covered with uniform layers of silica (48 nm) and SiN (51 nm). In each of the following four lithography steps, a thin layer of SiN is deposited on 8 out of the 16 pixels, leading to 24 = 16 different total thicknesses of the tuning layer. The deposited thicknesses are measured as 146.3 nm (target 140 nm), 72.7 nm (target 70 nm), 36.2 nm (target 35 nm), and 17.8 nm (target 17.5 nm), respectively. Consequently, the fabricated SiN tuning layers have total thicknesses ranging from 51 to 324 nm in approximately even steps. The tuning layers extend on top of and between the diode mesas and leave only the area of the contact pads uncovered. This ensures a uniform thickness within the optically active area of the pixels. Additionally, the sidewall of the mesas is covered and thereby shielded from oxidation or other influences of the surrounding. In the last lithography and lift-off step, a thin layer of gold (17.5 nm) is evaporated on top of the tuning layers as a top mirror, forming a planar cavity together with the silver bottom mirror underneath the diode layer stack. In total, the multi-pixel array has a footprint of 1.41 × 1.41 mm2 [see Fig. 2(a)]. After the fabrication of the spectral sensors is finished, the detector arrays are characterized electrically and optically.The electrical properties of the individual photodiodes were analyzed by measuring their IV characteristics using a 2 kΩ resistor and a multimeter. The obtained results are shown in Fig. 2(b) on a semi-logarithmic scale. At a forward bias of 1 V, currents up to 5 mA were observed. At −1 V reverse bias, dark currents in the range of a few μA are observed for most pixels, corresponding to current densities of 5 × 10−3 A/cm2. At zero bias, the typical resistance of the pixels is determined to be 1 MΩ; however, there are substantial differences between the values for individual pixels, which could be attributed to different properties of the wet-etched side surface, which may influence the reverse current. Comparing the slope of the IV curve to lateral transport measurements shows that the resistance of the pixels at zero bias is dominated by the vertical conduction through the semiconductor layers. The other main contributions to the measured resistance are the two ohmic contacts between the doped InGaAs contact layers and metal contact pads, as well as the resistance caused by the lateral conduction through the p-doped contact layer. Overall, the electrical characteristics indicate a functional diode allowing efficient generation and transport of the photocurrent.The wavelength-dependent responsivity of each pixel is measured using a broadband-light source with an 850 nm long-pass filter and a monochromator (output linewidth 8 nm) for the illumination. The incoming light from a multi-mode fiber (550 μm core size) is focused onto the optically active area of a pixel using a microscope. The resulting photocurrent is read out via a resistor of 10 kΩ using a multimeter. The experimentally obtained responsivity curves for each pixel are shown in Fig. 3(a). In agreement with the simulation [see Fig. 1(a)], the responsivity peaks cover the complete wavelength range between 890 and 1650 nm. Measurements of different arrays across the wafer revealed a typical variation of the peak wavelengths in the range of 5 nm. This is mainly caused by the epitaxially grown diode layers and the plasma-deposited tuning layers becoming thinner toward the edge of the sample, which causes a blue shift of the resonance wavelengths. The use of industrial-grade deposition equipment would strongly improve this uniformity. Using a Lorentzian fit of the peaks, their linewidth is determined as (55 ± 7) nm (minimum: 41.8 nm and maximum: 67.2 nm), which is in very good agreement with the simulation results [see Fig. 3(b)]. As the linewidth of the peaks is related to the optical losses in the cavity, the agreement between experimental and simulation results shows that the optical losses are dominated by absorption and out-coupling losses , which are considered in the simulation. Consequently, scattering losses due to the roughness of the fabricated surfaces only have a minor contribution to the total optical losses. With respect to our previous work,88. K. D. Hakkel, M. Petruzzella, F. Ou, A. van Klinken, F. Pagliano, T. Liu, R. P. J. van Veldhoven, and A. Fiore, Nat. Commun. 13, 103 (2022). https://doi.org/10.1038/s41467-021-27662-1 the improved design and fabrication process result in a linewidth reduction by a factor of 2–3, depending on the pixel and the mode considered. Additionally, the non-resonant background is reduced by a factor of 3–4 to about 3%–9% of the peak responsivity, making the responsivity peaks much more pronounced in the spectrum. Figure 3(a) shows that the peak responsivities vary throughout the wavelength range between 0.11 and 0.30 A/W, which is significantly lower compared to the simulation [between 0.2 and 0.55 A/W, see Fig. 1(a)]. Differences between measurements and simulations can be explained by deviations of the real and imaginary parts of the refractive index of the deposited and grown materials from the experimentally determined values that are used in the simulations. For the metal mirrors (gold, silver, and germanium), literature data for the complex refractive index were used in the simulation, which might not correctly represent the properties of the evaporated material layers in our device.The overall envelope of the responsivity curves, with a maximum around 1400 nm and a minimum around 1100 nm, also shows very good agreement with the simulation data shown in Fig. 1(a). This proves that our 1D model describes the field distribution and expected response of the individual pixels convincingly.In order to determine the dynamic range of the sensors and the smallest possible light power that can be detected, the photocurrent was read out using a transimpedance amplifier (transimpedance: 5 × 105 V/A) in combination with a lock-in amplifier (time constant: 3 s, DC filter slope: 24 dB, and noise-equivalent bandwidth: 0.026 Hz). The incoming laser light is tuned to the responsivity maximum of the illuminated pixel (pixel 13, 1540 nm) and passes through an attenuator and a chopper modulating the incoming light at 417 Hz, which also serves as a reference input to the lock-in amplifier. For four different settings of the attenuator, the measured photocurrent is determined for the different output powers of the laser, leading to illumination powers ranging from 4 pW to 6 μW. This leads to photocurrents between a few pA and 1.5 μA (see Fig. 4). The maximum photocurrent is hereby limited by the lock-in amplifier and not by the maximum photocurrent of the photodetectors. For light powers between 60 pW and 6 μW, i.e., over five orders of magnitude, an approximately linear relation between light power and photocurrent is observed: a power fit of the data points results in an exponent close to 1 (see power fit in Fig. 4). A linear fit of the same data results in a slope of 0.249 A/W, which is in good agreement with the responsivity value measured for this pixel and wavelength [0.257 A/W, see Fig. 3(a)]. For light powers below 20 pW, the measured photocurrents approach a constant value of about 4 pA, likely related to cross-talk in the measurement system. As the observed fluctuation of this value is of the same order as its average, we consider it as the noise level, from which we determine the smallest detectable illumination power as ∼20 pW in the present experimental configuration. This minimum power value is not limited by the photodetector itself but is subject to the choice of the read-out system. Lower values for the minimum detectable power have been observed when reading out the sensor with the lock-in amplifier directly (larger load resistance); however, the achievable dynamic range is limited in that case.We finally assess the applicability of the sensor to practical sensing problems and the expected performance improvement with respect to the previous generation. First, an experimental study was performed on determining the concentration of a solution of methanol in isopropanol, as described in the supplementary material, Sec. A. Using a partial least squares (PLS) analysis, a strong prediction model is obtained featuring an average ratio of performance to deviation (RPD) of 25. Second, a multiple linear regression model (MLR) was applied to a set of measured sample spectra combined with the measured response curves of the photodetector arrays presented here and in our previous work88. K. D. Hakkel, M. Petruzzella, F. Ou, A. van Klinken, F. Pagliano, T. Liu, R. P. J. van Veldhoven, and A. Fiore, Nat. Commun. 13, 103 (2022). https://doi.org/10.1038/s41467-021-27662-1 to compare the performance. The determination of the fat content in raw cow milk from its reflection spectrum was chosen in view of its practical relevance and as an exemplary application of near-infrared spectroscopy.18,1918. H. G. Yakubu, Z. Kovacs, T. Toth, and G. Bazar, Crit. Rev. Food Sci. Nutr. 62, 810 (2022). https://doi.org/10.1080/10408398.2020.182954019. W. Wrzeszcz, P. Tomza, M. Kwaśniewicz, S. Mazurek, R. Szostak, and M. A. Czarnecki, RSC Adv. 6, 37195 (2016). https://doi.org/10.1039/c6ra04595b Based on the dataset reported by Aernouts et al.,2020. B. Aernouts, E. Polshin, J. Lammertyn, and W. Saeys, J. Dairy Sci. 94, 5315 (2011). https://doi.org/10.3168/jds.2011-4354 an improvement in the RPD value of up to 84% was obtained for low noise levels (details on the method and analysis are provided in the supplementary material, Sec. B). For higher noise levels, the sensing performance of both arrays is expected to be similar according to the simulations, as the noise level becomes the limiting factor in the accuracy of the prediction model rather than the correlation between the photocurrent values of different pixels. It must be noted that the expected sensing performance of the photodetector array presented in this work and the improvement with respect to our previous work are highly dependent on the spectral characteristics of the considered sensing problem. Nevertheless, the simulations for this application case show clearly that the reported improved spectral properties can lead to a significant improvement in the sensing performance for real application cases. More details on the simulation procedure and the datasets for the sample spectra can be found in the supplementary information.In conclusion, we demonstrated an integrated spectral sensor consisting of an array of photodiodes with individual spectral responses. We reported a fabrication approach based on a series of optical lithography steps, through which SiN tuning layers with 16 different thicknesses are deposited stepwise. Leading to largely decreased surface roughness and uniform cavity heights across the entire optically active area, this novel fabrication approach results in a significantly decreased linewidth of the response peaks and reduced non-resonant background as compared to the previous demonstration of InGaAs NIR spectral sensors.88. K. D. Hakkel, M. Petruzzella, F. Ou, A. van Klinken, F. Pagliano, T. Liu, R. P. J. van Veldhoven, and A. Fiore, Nat. Commun. 13, 103 (2022). https://doi.org/10.1038/s41467-021-27662-1 Additionally, the use of optical lithography opens the way to high-volume manufacturing of such spectral sensors. The experimental results for the optical response are in good agreement with optical simulations, which can be used to find suitable design parameters. In previous studies,8,12–148. K. D. Hakkel, M. Petruzzella, F. Ou, A. van Klinken, F. Pagliano, T. Liu, R. P. J. van Veldhoven, and A. Fiore, Nat. Commun. 13, 103 (2022). https://doi.org/10.1038/s41467-021-27662-112. R. F. Kranenburg, F. Ou, P. Ševo, M. Petruzzella, R. de Ridder, A. van Klinken, K. D. Hakkel, D. M. J. van Elst, R. van Veldhoven, F. Pagliano, A. C. van Asten, and A. Fiore, Talanta 245, 123441 (2022). https://doi.org/10.1016/j.talanta.2022.12344113. F. Ou, A. van Klinken, P. Ševo, M. Petruzzella, C. Li, D. M. J. van Elst, K. D. Hakkel, F. Pagliano, R. P. J. van Veldhoven, and A. Fiore, Sensors 22, 7027 (2022). https://doi.org/10.3390/s2218702714. F. Ou, A. van Klinken, K. D. Hakkel, M. Petruzzella, D. M. J. van Elst, P. Ševo, C. Li, F. Pagliano, R. P. J. van Veldhoven, and A. Fiore, Spectroscopy Outside the Laboratory for Today’s Spectroscopists (Spectroscopy Online, 2022), Vol. 37, p. 34. we demonstrated that chemical information can be directly retrieved by building a regression model from the measured photocurrent values. This sensing approach can be applied in relevant application cases ranging from plastic sorting to the measurement of the nutritional properties of milk. The reduction of the linewidth demonstrated here leads to less overlap between the response functions and less correlation between the photocurrent values, which will lead to even higher prediction performance. For two application cases, the sensing performance was assessed experimentally and using simulations, demonstrating that a significant improvement in the sensing accuracy can be obtained. Overall, this work contributes to making spectral sensors suitable for cost-efficient, handheld devices for material analysis applications outside of the laboratory.DATA AVAILABILITY
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ChooseTop of pageABSTRACTDATA AVAILABILITY <<REFERENCESThe data that support the findings of this study are available from the corresponding author upon reasonable request.
See the supplementary material for a detailed description of the experimentally determined sensing performance of the methanol concentration in an isopropanol solution (Sec. A) and of the simulations to compare the expected performance in determining the fat content in raw cow milk with the photodetector array presented in this work and in our previous work88. K. D. Hakkel, M. Petruzzella, F. Ou, A. van Klinken, F. Pagliano, T. Liu, R. P. J. van Veldhoven, and A. Fiore, Nat. Commun. 13, 103 (2022). https://doi.org/10.1038/s41467-021-27662-1 (Sec. B).We thank B. Aernouts (KU Leuven) for the use of the reflection data of raw cow milk samples as presented in the supplementary material. We acknowledge J. J. P. M. Schulpen for his support with the ellipsometer measurements. This research was partially funded under NWO TTW Project No. 16670 (A.v.K., C.L. F.O., and R.P.J.v.V.), NWO Project No. 17626 (D.J.v.E.), the Penta Call 2 project Environmental Sensors for AIR Quality (ESAIRQ) Grant No. 16113 (K.D.H., M.P., and A.F.), the High Tech Systems and Materials (HTSM) Project No. 14658 (F.P.), and the NWO Zwaartekracht Research Center for Integrated Nanophotonics.Conflict of Interest
M.P., K.D.H., F.O., and F.P. are employees, and M.P., F.P., and A.F. are shareholders and co-founders of MantiSpectra B.V., the company commercializing the sensor. The remaining authors declare no competing interest.
Author Contributions
A.F., K.D.H., F.P., M.P., and A.v.K. developed the device concept. A.v.K, C.L., D.M.J.v.E., and M.P. optimized the fabrication recipe. C.L., A.v.K., D.M.J.v.E., and M.P. fabricated the devices. R.v.V. performed the sample growth of the active layers. A.v.K. performed the experiments. M.P. and D.M.J.v.E. developed the simulation code. A.F. supervised the project. A.v.K. and A.F. wrote the article. All authors discussed the work and contributed to writing and revising the article.
Anne van Klinken: Conceptualization (equal); Data curation (equal); Formal analysis (equal); Investigation (equal); Methodology (equal); Resources (equal); Visualization (equal); Writing – original draft (equal); Writing – review & editing (equal). Don M. J. van Elst: Methodology (equal); Resources (equal); Software (equal); Writing – review & editing (equal). Chenhui Li: Methodology (equal); Resources (equal); Writing – review & editing (equal). Maurangelo Petruzzella: Conceptualization (equal); Methodology (equal); Resources (equal); Software (equal); Writing – review & editing (equal). Kaylee D. Hakkel: Conceptualization (equal); Writing – review & editing (equal). Fang Ou: Writing – review & editing (equal). Francesco Pagliano: Conceptualization (equal). René van Veldhoven: Resources (equal). Andrea Fiore: Conceptualization (equal); Funding acquisition (equal); Methodology (equal); Project administration (equal); Supervision (equal); Writing – original draft (equal); Writing – review & editing (equal).
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